TOKYO SEIMITSU CO., LTD.
Patent Owner
Stats
- 92 US PATENTS IN FORCE
- 5 US APPLICATIONS PENDING
- Mar 20, 2018 most recent publication
Details
- 92 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 3,396 Total Citation Count
- Jul 25, 1984 Earliest Filing
- 247 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2017/0010,323 Semiconductor Wafer Inspection Apparatus And Semiconductor Wafer Inspection MethodAug 12, 16Jan 12, 17[H01L, G01R]
2007/0284,028 PEELING TAPE ADHERING METHOD AND PEELING TAPE ADHERING DEVICEMay 24, 07Dec 13, 07[B32B]
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9869715 Semiconductor wafer inspection apparatus and semiconductor wafer inspection methodAug 12, 16Jan 16, 18[H01L, G01R]
9778075 Rotation angle measurement device and rotation angle measurement methodApr 26, 16Oct 03, 17[G01D]
9664733 Probe device for testing electrical characteristics of semiconductor elementAug 24, 15May 30, 17[G01R]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
8065031 Polishing end point detection method utilizing torque change and device thereofExpiredSep 10, 07Nov 22, 11[B24B, G01L, G05B, G06F, H03F]
2011/0136,078 IMPLANT BODY, METHOD OF MANUFACTURE OF SAME, AND DENTAL IMPLANTAbandonedMay 29, 09Jun 09, 11[A61C]
7830141 Film thickness measuring apparatus and film thickness measuring methodExpiredJan 07, 09Nov 09, 10[G01B, G01R]
7821257 Method and device for forecasting/detecting polishing end point and method and device for monitoring real-time film thicknessExpiredAug 18, 08Oct 26, 10[B24B, G01B, G01R]
2009/0259,435 Roundness Measuring Instrument and Method of Determining Quality of Tip HeadAbandonedDec 01, 06Oct 15, 09[G01B]
7601615 Method of grinding back surface of semiconductor wafer and semiconductor wafer grinding apparatusExpiredOct 30, 06Oct 13, 09[H01L]
2009/0247,050 GRINDING METHOD FOR GRINDING BACK-SURFACE OF SEMICONDUCTOR WAFER AND GRINDING APPARATUS FOR GRINDING BACK-SURFACE OF SEMICONDUCTOR WAFER USED IN SAMEAbandonedMar 04, 09Oct 01, 09[B24B]
2009/0246,955 WAFER PROCESSING METHOD AND WAFER PROCESSING APPARATUSAbandonedDec 11, 08Oct 01, 09[B24B, H01L]
7501843 Movement amount operation correction method for prober, movement amount operation correction processing program, and proberExpiredApr 27, 06Mar 10, 09[G01R]
7492942 Image defect inspection method, image defect inspection apparatus, and appearance inspection apparatusExpiredAug 17, 05Feb 17, 09[G06K]
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